MUMBAI, India, March 13 -- Intellectual Property India has published a patent application (202611008438 A) filed by Swami Vivekananda Subharti University, Meerut, Uttar Pradesh, on Jan. 28, for 'a mechanically dormant, moisture-activated self-healing clay barrier composition and method for restoring impermeability in waste containment systems.'
Inventor(s) include Er. Aanchal Sharma; Er. Daud Chauhan; Er. Ibran Khan; and Er. Soni Dubey.
The application for the patent was published on March 13, under issue no. 11/2026.
According to the abstract released by the Intellectual Property India: "The present invention relates to a mechanically dormant, moisture-activated, crack-localized self-healing clay barrier for use in landfill liners and geotechnical waste containment systems. The clay barrier comprises a compacted composition of natural clay, bentonite, and microencapsulated swelling agents, wherein the encapsulated swelling agents remain substantially inactive under normal soil moisture and compaction conditions. Upon formation of cracks due to desiccation, differential settlement, or mechanical stress, localized moisture ingress at the cracked region causes selective rupture of the microcapsules, releasing the swelling agents only at the damaged location. The released swelling agents undergo localized volumetric expansion and cooperate with hydrated bentonite to fill and seal the crack, thereby restoring impermeability without inducing global swelling or altering bulk liner properties. The composition preferably comprises 60-70 wt.% natural clay, 18-25 wt.% bentonite, and 5-10 wt.% microencapsulated swelling agents."
Disclaimer: Curated by HT Syndication.
