MUMBAI, India, July 11 -- Intellectual Property India has published a patent application (202521049255 A) filed by Indian Institute Of Technology, Bhilai, Chhattisgarh, on May 22, for 'a polymeric coating and a method of synthesis thereof.'
Inventor(s) include Sanjib Banerjee; Sudipta Paul; Amul Jain; and Ankit Kumar Kaushik.
The application for the patent was published on July 11, under issue no. 28/2025.
According to the abstract released by the Intellectual Property India: "The present invention provides a novel polymeric coating in form of a di-block copolymer comprising a non-ionic monomer and a hydrophobic segment. The di-block copolymer is light stimuli responsive, multi-arm fluorinated polymer, poly(N,N dimethylacrylamide)-block-poly(2,2,2-trifluoro ethyl methacrylate)-umbelliferone (4-arm star (PDMA-b-PTFEMA)4-UMB) that is obtained by photo induced reversible deactivation radical polymerization (photoRDRP) of DMA and TFEMA, followed by chain end modification of the prepared 4-arm star (PDMA-b-PTFEMA)4-Br. Moreover, the present invention provides a stable polymeric coating that is self-healed and is photoresponsive, thus allowing precise, localized damage repair even in inaccessible areas that is critical for industrial application in the field of aerospace, construction, and electronics."
Disclaimer: Curated by HT Syndication.
