MUMBAI, India, Aug. 22 -- Intellectual Property India has published a patent application (202517043411 A) filed by Bae Systems Bofors Ab, Karlskoga, Sweden, on May 5, for 'adaptive shot patterns.'
Inventor(s) include Jonasson, Erik; and Eriksson, Frans.
The application for the patent was published on Aug. 22, under issue no. 34/2025.
According to the abstract released by the Intellectual Property India: "The invention relates to a method for shot pattern selection when combating targets with an impact system, whereas the following method steps are included; i.) estimating the position of the target, ii.) estimating the speed of the target, iii.) categorizing the type of target, iv.) selecting the type of shot pattern, v.) firing projectiles based on the selected shot pattern. The invention further relates to a fire-control system and an impact system."
The patent application was internationally filed on Nov. 12, 2023, under International application No.PCT/SE2023/051146.
Disclaimer: Curated by HT Syndication.
