MUMBAI, India, March 13 -- Intellectual Property India has published a patent application (202521008171 A) filed by Manish Jain, Pune, Maharashtra, on Jan. 31, 2025, for 'an adsorption composition for reduction of nitrosamine impurities in pharmaceutical products.'
Inventor(s) include Manish Jain; and Vivek Kumar Jha.
The application for the patent was published on March 13, under issue no. 11/2026.
According to the abstract released by the Intellectual Property India: "The present invention relates to an adsorption composition for reducing nitrosamine impurities such as NDMA (N-Nitrosodimethylamine) and NDEA (N-Nitrosodiethylamine), and for controlling moisture in pharmaceutical products. The adsorption composition includes the following ingredients: at least one porous adsorbent material, such as activated carbon, in an amount of about 50-70 w/w%, at least one moisture-regulating material, such as silica gel, in an amount of about 20-40 w/w%, and a binding agent in an amount of about 5-10 w/w%. Further, the present invention also discloses a process (100) of preparing a tablet for an adsorption composition with varying proportions of silica gel containing a binder. The combination of activated carbon and silica gel in the present invention achieves superior adsorption of harmful impurities and shows synergistic effects in the reduction of nitrosamine impurities, controlling moisture and ensuring cost efficiency, drug stability, and safety."
Disclaimer: Curated by HT Syndication.
