MUMBAI, India, June 6 -- Intellectual Property India has published a patent application (202517014237 A) filed by Resonac Corporation, Tokyo, on Feb. 19, for 'asphalt composition and production method therefor.'
Inventor(s) include Ohguma Yuya; Shibuya Akira; and Ogawa Noriko.
The application for the patent was published on June 6, under issue no. 23/2025.
According to the abstract released by the Intellectual Property India: "[Problem] To provide: a composition which includes asphalt for road pavement and which has improved oil resistance; and a method for producing the composition. [Solution] Provided is an asphalt composition comprising asphalt and a chloroprene-based polymer, in which the content of the chloroprene-based polymer is 5-20 parts by mass inclusive relative to 100 parts by mass of asphalt solid content and the chloroprene-based polymer has a tetrahydrofuran insoluble content of 20-90 mass% inclusive. Also provided is a method for producing an asphalt composition, the method comprising mixing an asphalt emulsion with a chloroprene latex so that the amount of the chloroprene latex, on a solid basis, is 5-20 parts by mass inclusive relative to 100 parts by mass of asphalt solid content in the asphalt emulsion to produce an asphalt composition in which the tetrahydrofuran insoluble content of the chloroprene-based polymer is 20-90 mass% inclusive."
The patent application was internationally filed on Dec. 28, 2023, under International application No.PCT/JP2023/047155.
Disclaimer: Curated by HT Syndication.
