MUMBAI, India, June 20 -- Intellectual Property India has published a patent application (202311084047 A) filed by Chairman, Defence Research & Development Organization, New Delhi, on Dec. 9, 2023, for 'chem-bio face mask for the filtration of toxic gases, bacteria and viruses from air.'
Inventor(s) include Akash Verma; Virendra Vikram Singh; Himanshi Dhyani; Suraj Bharati; Vikas Baburao Thakare; Pushpendra Kumar Sharma; Lokesh Kumar Pandey; Suresh Kumar Shrivas; Manisha Sathe; and Sanjay Upadhyay.
The application for the patent was published on June 20, under issue no. 25/2025.
According to the abstract released by the Intellectual Property India: "The present disclosure relates to a filter media, comprising: an outer layer configured to contact an external environment comprising a multifunctional aramid fiber material; a middle layer disposed on the inner side of the outer layer; an inner layer comprising spun bound nonwoven fabric disposed on the inner side of the middle layer configured to contact a wearer's nose and mouth; wherein the middle layer comprises: at least one layer of silver embedded nanoweb; at least one layer of activated carbon fibre (ACF) substrate impregnated with a metal salt selected from the group consisting of CuCl2, Zr(OH)4 and NaOH or a combination thereof."
Disclaimer: Curated by HT Syndication.
