MUMBAI, India, Nov. 7 -- Intellectual Property India has published a patent application (202514028766 A) filed by Caterpillar Inc., Peoria, U.S.A., on March 26, for 'duct for after treatment system.'
Inventor(s) include Biswas, Shib Shankar.
The application for the patent was published on Nov. 7, under issue no. 45/2025.
According to the abstract released by the Intellectual Property India: "A duct for an aftertreatment system includes a body defining an inlet opening, an outlet opening, and an inner surface extending from the inlet opening to the outlet opening. The duct includes a plurality of locating pads coupled to the inner surface of the body. Any one of the plurality of locating pads defines a slot. The duct includes a mixing device coupled to the body and including a plurality of first elongate members, a plurality of second elongate members, and a plurality of mixing elements. The duct includes at least one first locating member coupled to a corresponding first elongate member and at least one second locating member coupled to a corresponding second elongate member. Any one of the at least one first locating member and the at least one second locating member includes a projection."
Disclaimer: Curated by HT Syndication.
