Intellectual Property India Publishes Patent Application for 'Functionalized Colloidal Silica And Methods Of Production' Filed by W. R. Grace & Co. -Conn

MUMBAI, India, June 27 -- Intellectual Property India has published a patent application (202517054033 A) filed by W. R. Grace & Co. -Conn, Columbia, U.S.A., on June 4, for 'functionalized colloidal silica and methods of production.'

Inventor(s) include Gu, Feng; and Chapman, David M.

The application for the patent was published on June 27, under issue no. 26/2025.

According to the abstract released by the Intellectual Property India: "The present disclosure is directed to compositions that include water and a functionalized colloidal silica, where the functionalized colloidal silica includes silica particles (where each silica particle includes a surface) as well as a structural unit according to Formula I and/or a structural unit according to Formula II. The present disclosure also is directed to methods of making compositions of the present technology."

The patent application was internationally filed on Dec. 05, 2023, under International application No.PCT/US2023/082582.

Disclaimer: Curated by HT Syndication.