MUMBAI, India, Feb. 27 -- Intellectual Property India has published a patent application (202641019018 A) filed by Nitte, Mangaluru, Karnataka, on Feb. 19, for 'handloom pattern classification system.'
Inventor(s) include Sandhya D Kotian; Raksha Puthran; and Anusha Prashanth Shetty.
The application for the patent was published on Feb. 27, under issue no. 09/2026.
According to the abstract released by the Intellectual Property India: "Disclosed herein is a handloom pattern classification system (100) comprising a capturing unit (104) configured to capture images of handloom fabrics and a user device (102) hosting the capturing unit (104) to process the captured images. An application programming interface (110) hosted on the user device (102) enables user interaction and displays processed classification results. A processing unit (112) integrated within the user device (102) processes and analyses the images for pattern classification through multiple modules, including an input module (114), a pre-processing module (116) for noise removal and enhancement, a feature extraction module (118) for visual attribute detection, a training and testing module (120), an identification module (122) using a deep learning model, a comparison module (124), a confidence score generation module (126), a prediction module (128), and an output module (130)."
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