Intellectual Property India Publishes Patent Application for 'Intrinsically Antifungal Denture Base Composition And Method Of Preparation Thereof' Filed by Graphic Era

MUMBAI, India, May 29 -- Intellectual Property India has published a patent application (202611049166 A) filed by Graphic Era, Dehradun, Uttarakhand, on April 17, for 'intrinsically antifungal denture base composition and method of preparation thereof.'

Inventor(s) include Payal Gupta; Bhawana Yadav; Amit Kumar; Krishna Mohan Poluri; and Jinan Alhari.

The application for the patent was published on May 29, under issue no. 22/2026.

According to the abstract released by the Intellectual Property India: "The Invention relates to development of an intrinsically antifungal polymethyl methacrylate (PMMA) denture nanocomposite (MCZ-P-AgNPs/PMMA) prepared by incorporating miconazole-loaded pectin-stabilized silver nanoparticles (MCZ-P-AgNPs) into PMMA matrix."

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