MUMBAI, India, May 29 -- Intellectual Property India has published a patent application (202611050255 A) filed by Noida Institute Of Engineering & Technology, Greater Noida, Uttar Pradesh, on April 20, for 'light extraction enhancement device and method thereof.'
Inventor(s) include Swati Singh; and Mangey Ram Nagar.
The application for the patent was published on May 29, under issue no. 22/2026.
According to the abstract released by the Intellectual Property India: "Disclosed herein is a light extraction enhancement device and method thereof (100) that comprises a substrate (102) configured to support device formation and provide electrical conduction, a monolayer material layer (104) disposed on the substrate (102) and configured to define a patternable material region, a porous masking layer (106) positioned over the monolayer material layer (104) and configured to define a spatial pattern for material protection, a patterned metal layer (108) connected to the monolayer material layer (104), a plurality of nanoscale dot structures (110) connected to the patterned metal layer (108), a light emitting unit (112) connected to the plurality of nanoscale dot structures (110), a fabrication unit (114) connected to a plurality of device (100) components, the fabrication unit (114) comprising; a mask alignment unit (116), a deposition unit (118), an etching unit (120), a removal unit (122) connected to the etching unit (120)."
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