MUMBAI, India, March 7 -- Intellectual Property India has published a patent application (202517013820 A) filed by Dai Nippon Printing Co. Ltd., Tokyo, on Feb. 18, for 'long phase difference film, long optical film, long polarizing film, manufacturing method for long phase difference film, and manufacturing method for long optical film.'
Inventor(s) include Hiruma Yusuke; Takahashi Terutaka; Otsu Moeko; and Furugen Ryo.
The application for the patent was published on March 7, under issue no. 10/2025.
According to the abstract released by the Intellectual Property India: "A long retardation film (10) including a longitudinal direction (D2) and a lateral direction (D1) is provided with a substrate (20), and a retardation layer (40) superposed on the substrate (20). The retardation layer (40) includes a first region (41) and a pair of second regions (42). The first region (41) is located between the pair of second regions (42) in the lateral direction (D1). The retardation layer (40) includes a cured product of a liquid crystal composition. The second region (42) has a second slow axis (A42). A second orientation angle (?42) between the second slow axis (A42) and the longitudinal direction (D2) is 0 or more but less than 10, or 170 to 180 exclusive."
The patent application was internationally filed on July 21, 2023, under International application No.PCT/JP2023/026797.
Disclaimer: Curated by HT Syndication.
