MUMBAI, India, March 7 -- Intellectual Property India has published a patent application (202327033842 A) filed by Lvfen Environmental Protection Tech Co. Ltd., Beijing, on May 14, 2023, for 'method and device for removing impurities from granular material.'
Inventor(s) include Liu, Tianbo; and Peng, Huaiming.
The application for the patent was published on March 7, under issue no. 10/2025.
According to the abstract released by the Intellectual Property India: "A method and device for removing impurities from a granular material. The method comprises: using at least one of a low-frequency sound wave gas guided-wave mode, a high-frequency sound wave gas guided-wave mode and a high-frequency sound wave solid guided-wave mode to make a sound wave be transferred to a granular material (K1) from which impurities are to be removed, so as to reduce the binding force between the granular material and impurities in the granular material (K1) from which impurities are to be removed, and also using a gas flow to enhance the separation between the impurities and the granular material, wherein the low-frequency sound wave gas guided-wave mode refers to a low-frequency sound wave being transferred by taking a gas as a guided-wave medium; the high-frequency sound wave gas guided-wave mode refers to a high-frequency sound wave being transferred by taking a gas as a guided-wave medium; and the high-frequency sound wave solid guided-wave mode refers to a high-frequency sound wave being transferred by taking a solid as a guided-wave medium. An acoustic fatigue effect for a granular material and impurities attached to the surface thereof is realized using the acoustic energy of a sound wave, such that the binding force between the granular material and the impurities can be weakened or even removed, the impurities in the granular material can be quickly and effectively removed, and the separation efficiency and the separation precision are high."
The patent application was internationally filed on Nov. 16, 2021, under International application No.PCT/CN2021/130949.
Disclaimer: Curated by HT Syndication.
