MUMBAI, India, Jan. 23 -- Intellectual Property India has published a patent application (202511126314 A) filed by Raghav Productivity Solutions Private Limited, Jaipur, Rajasthan, on Dec. 13, 2025, for 'method and system for producing nali top (nt) grade ramming mass from fine fractions.'
Inventor(s) include Sanjay Kabra.
The application for the patent was published on Jan. 23, under issue no. 04/2026.
According to the abstract released by the Intellectual Property India: "Method and System for Producing Nali Top (NT) Grade Ramming Mass from Fine Fractions The present invention discloses a method and system for producing fine fractions in the manufacture of ramming mass from quartz or quartzite boulders. The method involves crushing the boulders in a primary crusher to yield intermediate-sized material, further crushing in a secondary cone crusher to produce crushed fractions, and screening the fractions using vibrating screeners to separate fine fractions with particle sizes less than 6 mm. These fine fractions are diverted directly via conveyor belts to dedicated silos, bypassing additional crushing and color sorting, and stored as a separate Nali Top (NT) grade product line. The NT grade, comprising sub-fractions such as 0-1 mm, 1-2 mm, 2-3 mm, and 3-4 mm, is suitable for furnace spout and top making applications without integration into main ramming mass grades, and can also serve as feedstock for ball mill fines production. The system includes primary and secondary cone crushers, vibrating screeners, diversion mechanisms, and at least four dedicated silos each with approximately 100 cubic meters capacity. An automated programmable logic controller (PLC) weighing and discharge system enables precise blending of the fine fractions for uniform NT grade ramming mass. Integrated into a continuous production plant, the invention enhances overall yield by transforming fine fractions from by-products into a premium, marketable product with consistent quality, slightly inferior to main grades but optimized for reduced-contact refractory uses."
Disclaimer: Curated by HT Syndication.
