MUMBAI, India, Aug. 29 -- Intellectual Property India has published a patent application (202517074595 A) filed by Gsec German Semiconductor Equipment Company Gmbh, Radolfzell am Bodensee, Germany, on Aug. 5, for 'method for cleaning pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or for lithography masks, with a corresponding device.'
Inventor(s) include Rebstock, Lutz.
The application for the patent was published on Aug. 29, under issue no. 35/2025.
According to the abstract released by the Intellectual Property India: "The present invention relates to a method for cleaning pot-shaped hollow bodies (12), in particular transport containers (30) for semiconductor wafers or for lithography masks, said method comprising the following steps: - dispensing a first cleaning fluid by means of the first dispensing unit (43) in order to clean the inner surface (33) of the hollow body; - discharging the first cleaning fluid by means of the first discharge channel (70), the first cleaning fluid having a first surface tension; - dispensing a second cleaning fluid by means of the first dispensing unit (43) in order to clean the inner surface (33) of the hollow body, the second fluid being miscible with the first cleaning fluid and the resulting mixture of the first cleaning fluid and the second cleaning fluid having a mixture surface tension which is lower than the first surface tension; and - discharging the mixture by means of the first discharge channel (70) or a further discharge channel."
The patent application was internationally filed on Jan. 04, 2024, under International application No.PCT/EP2024/050144.
Disclaimer: Curated by HT Syndication.
