MUMBAI, India, July 5 -- Intellectual Property India has published a patent application (202517058460 A) filed by Apr Co. Ltd., Seoul, Republic of Korea, on June 18, for 'method for controlling cosmetic procedure apparatus.'
Inventor(s) include Ji, Jong Chul; Lee, Gyoun Jung; and Park, Seung Woo.
The application for the patent was published on July 4, under issue no. 27/2025.
According to the abstract released by the Intellectual Property India: "Disclosed is a method for controlling a cosmetic procedure apparatus. A method for controlling a cosmetic procedure apparatus according to one aspect of the present invention comprises: a skin suctioning step for generating negative pressure in a suction space and thereby suctioning skin into the suction space; a skin height detection step for detecting the height of the skin suctioned into the suction space; and a high frequency application determination step for determining whether or not to operate a high frequency applying unit according to the height of the skin determined in the skin height detection step wherein, in the skin height detection step, it is possible to detect which electrode terminal among a plurality of electrode terminals of the high frequency applying unit is in contact with the skin and conducting electricity."
The patent application was internationally filed on Dec. 22, 2023, under International application No.PCT/KR2023/021467.
Disclaimer: Curated by HT Syndication.
