MUMBAI, India, July 25 -- Intellectual Property India has published a patent application (202517066501 A) filed by Kabushiki Kaisha Toshiba; and Toshiba Energy Systems & Solutions Corporation, Tokyo, on July 11, for 'method for manufacturing photoelectric conversion element.'
Inventor(s) include Gotanda Takeshi; Tobari Tomohiro; and Saita Yutaka.
The application for the patent was published on July 25, under issue no. 30/2025.
According to the abstract released by the Intellectual Property India: "A method for manufacturing a photoelectric conversion element according to an embodiment has a first film formation step and a second film formation step. In the first film formation step, a first layer made of BX2 is formed on a surface of a substrate in a first film formation chamber. In the second film formation step, a second layer made of AX is formed on the first layer made of BX2 in a second film formation chamber. Here, AX is a first ammonium halide, BX2 is a metal halide, A is at least one among CH3NH3, C2H5NH3, C3H7NH3, and C4H9NH3, B is at least one among Pb and Sn, and X is at least one among F, Cl, Br, I, and At."
The patent application was internationally filed on Mar. 16, 2023, under International application No.PCT/JP2023/010349.
Disclaimer: Curated by HT Syndication.
