MUMBAI, India, Sept. 12 -- Intellectual Property India has published a patent application (202517081297 A) filed by Kureha Corporation, Tokyo, on Aug. 27, for 'method for manufacturing vinylidene fluoride copolymer.'
Inventor(s) include Yamane Takuya; Igarashi Tamito; and Kamata Shintarou.
The application for the patent was published on Sept. 12, under issue no. 37/2025.
According to the abstract released by the Intellectual Property India: "Provided is a method for manufacturing a vinylidene fluoride copolymer that can suppress the adhesion of polymers inside a reaction vessel during manufacture and that can manufacture the vinylidene fluoride copolymer with high productivity. This method for manufacturing a vinylidene fluoride copolymer contains structural units derived from vinylidene fluoride and structural units derived from a compound indicated by formula (1) and has a step for suspending polymerization of monomers containing vinylidene fluoride and the compound represented by formula (1) in the presence of a suspending agent, wherein the step for suspending polymerization includes: performing the polymerization reaction at a polymerization temperature that is at the critical temperature of the vinylidene fluoride or higher and below the gelation temperature of the suspending agent; and adding a portion of the total amounts to be added for each of the vinylidene fluoride and the compound represented by formula (1) to the reaction system before the start of polymerization, heating the reaction system to the polymerization temperature, and then adding the remainder of the total amounts to be added for each of these compounds to the reaction system either continuously or intermittently."
The patent application was internationally filed on Feb. 27, 2024, under International application No.PCT/JP2024/006987.
Disclaimer: Curated by HT Syndication.
