MUMBAI, India, June 6 -- Intellectual Property India has published a patent application (202417083230 A) filed by CNBM Research Institute For Advanced Glass Materials Group Co. Ltd., Anhui, China, on Oct. 30, 2024, for 'method for optimizing aspect ratio of metal grid based on surface modification.'
Inventor(s) include Shen, Yilei; and Stoelzel, Marko.
The application for the patent was published on June 6, under issue no. 23/2025.
According to the abstract released by the Intellectual Property India: "A method for optimizing the aspect ratio of a metal grid based on surface modification includes: obtaining a photovoltaic module including a front electrode; providing a laser process on the front electrode; and forming protrusion structures on the top of the front electrode by laser induction, at least two rows of protrusion structure groups forming a confining space, so that the width of liquid applied is confined within the spacing between the two adjacent protrusion structure groups and the thickness of the liquid applied is confined within the height of the formed protruding. Since the upwardly shaped protrusion structures, which may be irregular structures, are formed by laser induction on the top of the front electrode composed of a material of the front electrode, the ink and/or paste applied are confined between two or more lines."
The patent application was internationally filed on Nov. 24, 2023, under International application No.PCT/CN2023/134046.
Disclaimer: Curated by HT Syndication.
