MUMBAI, India, June 27 -- Intellectual Property India has published a patent application (202517054551 A) filed by Mitsubishi Gas Chemical Company, Inc., Tokyo, on June 6, for 'method for producing diamine containing cyclohexane ring.'
Inventor(s) include Sugita Takuya; Yamaichi Aoto; Misaki Satoshi; and Muneyasu Kuniaki.
The application for the patent was published on June 27, under issue no. 26/2025.
According to the abstract released by the Intellectual Property India: "A method for producing a diamine containing a cyclohexane ring, the method comprising hydrogenating a diamine containing an aromatic ring in the presence of: a metal-containing alumina catalyst obtained by regeneration in catalyst regeneration steps comprising a step (1) in which a metal-containing alumina catalyst is washed at 0-28 C with water and a step (2) in which after the step (1), the metal-containing alumina catalyst is brought into contact with a hydrogen-containing gas at a temperature exceeding 200 C but not higher than 500 C; and a solvent comprising at least one amine selected from the group consisting of alkylamines and alkyldiamines."
The patent application was internationally filed on Dec. 05, 2023, under International application No.PCT/JP2023/043413.
Disclaimer: Curated by HT Syndication.
