MUMBAI, India, July 5 -- Intellectual Property India has published a patent application (202517055790 A) filed by Essilor International, Charenton-le-Pont, France, on June 10, for 'method of curing a polythiourethane based substrate tolerant to water.'
Inventor(s) include Fromentin, Pierre; and Yuktanan, Pimchaya.
The application for the patent was published on July 4, under issue no. 27/2025.
According to the abstract released by the Intellectual Property India: "The invention relates to a method of curing a polythiourethane based transparent casted substrate from at least one pre-polymer, comprising providing a first component A comprising a polythiourethane pre-polymer A1 having isocyanate or isothiocyanate end groups of formula - NCX where X is O or S or comprising at least one polyisocyanate or polyisothiocyanate monomer A2, providing a second component B comprising a polythiourethane pre-polymer B1 having thiol end groups or comprising at least one polythiol monomer B2, mixing together first and second components A and B and filling a molding cavity of a casting mold assembly with the resulting polymerizable mixture, curing said polymerizable mixture to obtain a polythiourethane based transparent substrate, and obtaining polythiourethane based transparent substrate from the casting mold assembly, wherein the total water content in the monomers used in steps 1) and 2) or 1') and 2') or 1") and 2") represents from 750 ppm to 4000 ppm by weight relative to the weight of the polymerizable compounds present in said polymerizable mixture."
The patent application was internationally filed on Dec. 14, 2023, under International application No.PCT/EP2023/085954.
Disclaimer: Curated by HT Syndication.
