MUMBAI, India, Feb. 27 -- Intellectual Property India has published a patent application (202641018705 A) filed by Saveetha Engineering College, Chennai, Tamil Nadu, on Feb. 19, for 'photon induced method (pim)(halogen-light-assisted) for nanoparticles synthesis (oxygen rich, bandgap engineering, visible light photocatalyst and mesopores structure).'
Inventor(s) include Dr. Moganesh G.
The application for the patent was published on Feb. 27, under issue no. 09/2026.
According to the abstract released by the Intellectual Property India: "Photon Induced Method (PIM)(Halogen-Light-Assisted) for Nanoparticles Synthesis (Oxygen Rich, Bandgap Engineering, Visible light photocatalyst and mesopores structure) The invention provides a halogen-light-assisted Photon Induced method(PIM) for synthesizing oxygen-rich metal and plant-based nanoparticles using only a single metal precursor (e.g., Ni, Ti, Mg, Zn) and distilled water. Under visible halogen light irradiation, localized heating triggers nanoparticle formation without the use of dopants, surfactants, oxidizers, or reducing agents. The method is simple, green, and energy-efficient, producing nanomaterials with controlled structure, crystallinity, and optical bandgap. Compared to hydrothermal, sol-gel, and co-precipitation methods, this approach is safer, chemical-free, and environmentally benign, suitable for biomedical, catalytic, and electronic applications."
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