MUMBAI, India, Sept. 12 -- Intellectual Property India has published a patent application (202527079764 A) filed by Atotech Deutschland Gmbh & Co. Kg, Berlin, on Aug. 22, for 'plating bath composition for plating of precious metal and a method for depositing a precious metal layer.'
Inventor(s) include Spreemann, Robert; Lautan, Donny; Kraft, Boris Alexander; and Voloshyn, Dimitri.
The application for the patent was published on Sept. 12, under issue no. 37/2025.
According to the abstract released by the Intellectual Property India: "An aqueous precious metal plating bath, comprising (a) at least one source of precious metal ions; (b) at least one source of hexacyanoferrate (II) ions and/or hexacyanoferrate (III) ions; (c) optionally, at least one source of halogenide; (d) at least one complexing agent; (e) at least one reducing agent for precious metal ions; (f) optionally at least one wetting agent; and (g) optionally, at least one accelerator and a method of depositing of precious metal. The aqueous precious metal plating bath is suitable to provide soft precious metal layers useful for wire bonding and soldering applications which are required for electronic components."
The patent application was internationally filed on Jan. 24, 2024, under International application No.PCT/EP2024/051684.
Disclaimer: Curated by HT Syndication.
