Intellectual Property India Publishes Patent Application for 'Ruthenium-Based Complex (RU-NAN) And A Process Of Preparing The Same' Filed by Indian Institute Of Technology

MUMBAI, India, Jan. 2 -- Intellectual Property India has published a patent application (202541122810 A) filed by Indian Institute Of Technology, Hyderabad, Telangana, on Dec. 5, 2025, for 'ruthenium-based complex (ru-nan) and a process of preparing the same.'

Inventor(s) include Ganesan Prabusankar; Aravind Kumar Rengan; Rakesh Kumar Rai; Tanvi Sonpipare; Aishwarya Tiwari; and Sasvat Sayee Ram R.

The application for the patent was published on Jan. 2, under issue no. 01/2026.

According to the abstract released by the Intellectual Property India: "The present disclosure relates to a ruthenium-based complex (Ru-NAN) of general formula I for radiosensitization and has antibacterial activity: Formula I The said complex provides ultralow-dose X-ray mediated eradication of the radioresistant bacterium Deinococcus radiodurans. The present disclosure also relates to a process of preparing the said complex."

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