MUMBAI, India, Sept. 26 -- Intellectual Property India has published a patent application (202537072755 A) filed by Beijing Roborock Technology Co. Ltd., Beijing, on July 31, for 'self-cleaning maintenance station and self-cleaning maintenance system.'
Inventor(s) include Cheng, Pan; and Lin, Xiang.
The application for the patent was published on Sept. 26, under issue no. 39/2025.
According to the abstract released by the Intellectual Property India: "A self-cleaning maintenance station and a self-cleaning maintenance system. The self-cleaning maintenance station comprises a maintenance station bottom plate (1000), a maintenance station body (2000), a clean water tank (4000) and a cleaning liquid tank (3000). The maintenance station body (2000) comprises a water storage cavity (2700), which has an upward opening and is provided on the top of the maintenance station body (2000), and the clean water tank (4000) is mounted in or removed from the maintenance station body (2000) in the vertical direction. The maintenance station body (2000) further comprises a cleaning liquid cavity (2400), which is provided in the maintenance station body (2000) with the opening direction substantially perpendicular to the opening direction of the water storage cavity (2700). The cleaning liquid tank (3000) is mounted in or removed from the maintenance station body (2000) in the direction substantially perpendicular to the mounting direction of the clean water tank (4000)."
The patent application was internationally filed on Jan. 02, 2024, under International application No.PCT/CN2024/070218.
Disclaimer: Curated by HT Syndication.
