MUMBAI, India, Nov. 14 -- Intellectual Property India has published a patent application (202547098701 A) filed by Oerlikon Surface Solutions Ag, Pfaffikon, Switzerland, on Oct. 13, for 'si- and al/si-containing top coatings.'
Inventor(s) include Richter, Sophie; Widrig, Beno; Hunold, Oliver; Zauner, Lukas; Ramm, Jurgen; and Riedl-Tragenreif, Helmut.
The application for the patent was published on Nov. 14, under issue no. 46/2025.
According to the abstract released by the Intellectual Property India: "The present invention relates to a coated substrate having a coated surface being formed by a surface of a substrate (1) and a coating provided on said substrate surface, the coating comprising at least one Si-containing coating film (200) and a base coating film (100) deposited between the substrate (1) and the Si-containing coating film (200), characterized in that, the base coating film (100) is applied between the substrate (1) and the Si-containing coating film (200), wherein the Si-containing coating film (200) comprises at least two Si-containing layers, a first Si-containing layer (210) and a second Si-containing layer (220), wherein the first Si-containing layer (210) is deposited closer to the base coating film (100) than the second Si-containing layer (220). Furthermore, the present invention relates to a method for producing a coated substrate."
The patent application was internationally filed on May 17, 2024, under International application No.PCT/EP2024/063821.
Disclaimer: Curated by HT Syndication.
