Intellectual Property India Publishes Patent Application for 'Systems And Methods For The Degradation Of Polymer Materials' Filed by Depoly Sa

MUMBAI, India, June 20 -- Intellectual Property India has published a patent application (202517021878 A) filed by Depoly Sa, Sion, Switzerland, on March 11, for 'systems and methods for the degradation of polymer materials.'

Inventor(s) include Valizadeh Bardiya; and Valadares Daniel.

The application for the patent was published on June 20, under issue no. 25/2025.

According to the abstract released by the Intellectual Property India: "Provided is a system and associated method for the degradation of plastic materials. The system includes a body hopper conveying system drive system and a UV light assembly. The associated method includes providing a polymer material into the hopper providing a solvent into the hopper activating the drive system and activating the UV light."

The patent application was internationally filed on Oct. 13, 2023, under International application No.PCT/EP2023/078580.

Disclaimer: Curated by HT Syndication.