Intellectual Property India Publishes Patent Application for 'Thiolactone-Derived Compounds For Generating Nitric Oxide And Methods Of Forming The Same' Filed by Sterile State, Llc

MUMBAI, India, July 5 -- Intellectual Property India has published a patent application (202517058905 A) filed by Sterile State, Llc, Farmington Hills, U.S.A., on June 19, for 'thiolactone-derived compounds for generating nitric oxide and methods of forming the same.'

Inventor(s) include Frost, Megan Cecelia.

The application for the patent was published on July 4, under issue no. 27/2025.

According to the abstract released by the Intellectual Property India: "A nitric oxide precursor for providing nitric oxide is provided. The nitric oxide precursor comprises a reaction product of a thiolactone, a primary amine, and a nitrosating compound. The nitric oxide precursor is capable of decomposing to form nitric oxide."

The patent application was internationally filed on Nov. 20, 2023, under International application No.PCT/US2023/080533.

Disclaimer: Curated by HT Syndication.