MUMBAI, India, Sept. 26 -- Intellectual Property India has published a patent application (202547082208 A) filed by Ce Cell Engineering Gmbh, Kabelsketal, Germany, on Aug. 29, for 'wafer-based solar cell, and method for manufacturing such a wafer-based solar cell.'
Inventor(s) include Krassowski, Eve.
The application for the patent was published on Sept. 26, under issue no. 39/2025.
According to the abstract released by the Intellectual Property India: "The invention relates to wafer-based solar cell comprising a semiconductor wafer that is made of monocrystalline or polycrystalline silicon semiconductor material and has a semiconductor wafer surface, at least one p-doped region, and at least one n-doped region, wherein the p-doped region and/or the n-doped region is electrically contacted, via opening regions and current contact regions located therein, with a metal electrode structure attached to the semiconductor wafer surface, and the metal electrode structure covers an electrode coverage area on the semiconductor wafer surface, and wherein the semiconductor wafer surface of the wafer-based solar cell has a passivation layer arranged between the semiconductor material and the metal electrode structure, and wherein the current contact regions are guided through the passivation layer. The aim of the invention is to provide a wafer-based solar cell, wherein the wafer-base solar cell has a reduced electrical contact resistance in order to increase the efficiency of the wafer-based solar cell. This aim is achieved by arranging a phase change region (9) in the semiconductor material at the current contact regions (5), and by designing the semiconductor material to be at least partially amorphous and/or at least partially nanocrystalline in this phase change region (9)."
The patent application was internationally filed on Dec. 14, 2024, under International application No.PCT/DE2024/101075.
Disclaimer: Curated by HT Syndication.
