Intellectual Property India Publishes Patent Application for 'Working Medium, Composition For Thermal Cycle, Thermal Cycle Device And Thermal Cycle Method' Filed by Agc Inc.

MUMBAI, India, Aug. 22 -- Intellectual Property India has published a patent application (202517072682 A) filed by Agc Inc., Tokyo, on July 31, for 'working medium, composition for thermal cycle, thermal cycle device and thermal cycle method.'

Inventor(s) include Hayamizu, Hiroki.

The application for the patent was published on Aug. 22, under issue no. 34/2025.

According to the abstract released by the Intellectual Property India: "This working medium comprises (E)-1,3,3,3-tetrafluoropropene, (Z)1-chloro-2,3,3,3-tetrafluoropropene, and 1,1,1,2-tetrafluoroethane, wherein with respect to the total content of (E)-1,3,3,3-tetrafluoropropene, (Z)1-chloro-2,3,3,3-tetrafluoropropene, and 1,1,1,2-tetrafluoroethane, the content of 1,1,1,2-tetrafluoroethane is not more than 14.5 mass%, the content of (Z)1-chloro-2,3,3,3-tetrafluoropropene is not more than 10.0 mass%, and the content of (E)-1,3,3,3-tetrafluoropropene is not less than 75.5 mass%."

The patent application was internationally filed on Jan. 26, 2024, under International application No.PCT/JP2024/002523.

Disclaimer: Curated by HT Syndication.