MUMBAI, India, June 24 -- Intellectual Property India has published a patent application (202411093096 A) filed by Bagavathi, Magesh; Karajagl, Nachiket; Paliwal, Sagar; Verma, Aditya; and Vuduturi, Karthik on November 28, 2024, for A Manufacturing System Including A Machine Learning Feedback Loop.
Inventors include Bagavathi, Magesh; Karajagl, Nachiket; Paliwal, Sagar; Verma, Aditya; and Vuduturi, Karthik.
The application for the patent was published on June 12, 2026, under issue no. 24/2026.
Abstract: Systems and methods analyze data received from assets in a manufacturing environment, determine a first parameter is over or under a first predetermined threshold for an asset using a first machine learning model deployed on the manufacturing system, and generate an updated parameter value to adjust the asset. The systems and methods analyze a subset of sensor data in the manufacturing system using the first machine learning model, determine an actual accuracy rate of the first machine learning model based on an output by the first machine learning model from analysis of the subset of the sensor data, and based on determining that the actual accuracy rate is below a predefined threshold corresponding to a deployed accuracy rate, trigger a retraining of the first machine learning model using at least the subset of sensor data in the camera feed as training data.
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