MUMBAI, India, July 24 -- Intellectual Property India has published a patent application (202621064927 A) filed by Indian Institute Of Technology Bombay on May 22, 2026, for A Method And System Of Fabricating Microneedle Structures For Biomedical Applications.
Inventors include Prasanna Subhash Gandhi; Bhole Kiran Suresh; Aneesh Risbud; and Rajendra Kumar Arya.
The application for the patent was published on July 17, 2026, under issue no. 29/2026.
Abstract: The present disclosure related to an economical and scalable method and system of fabricating microneedle structures for biomedical applications. The method and system allow for precise control over the structural characteristics of the fabricated microneedles. The method and system disclosed utilizes the photopolymerization of a photopolymer resin composition (235) comprising at least one nanoparticle of a pre-defined concentration and a predefined particle size in a photopolymer resin vat (230). The method and system enhance mechanical properties, adhesion, and customizability, making it an economically viable and scalable process. Reference Figure: Figure. 1
Disclaimer: Curated by HT Syndication.
