MUMBAI, India, July 30 -- Intellectual Property India has published a patent application (202621065084 A) filed by Pratiksha Dinkar Donolikar; Shivaji Babaso Sadale; and Shivaji University on May 23, 2026, for A Method For The Fabrication Of Porous Nanostructured Thin Films Of Graphitic Carbon Nitride For Photocatalytic Application.
Inventors include Shivaji Babaso Sadale; and Pratiksha Dinkar Donolikar.
The application for the patent was published on July 24, 2026, under issue no. 30/2026.
Abstract: ABSTRACT Photocatalysis addresses multiple challenges regarding purification of wastewater, including disinfection of microorganisms, mineralization of pharmaceutical contaminants, breakdown of dissolved toxic compounds and degradation of persistent dyes. Among these, the purification of wastewater by removal of dyes with mobilized photocatalyst is the most considered approach, but it has limitations such as low efficiency of separation and post process recovery of photocatalysts. To overcome these limitations, an immobilized photocatalyst in the form of thin film of graphitic carbon nitride (g-C3N4) was used in the present study. The powder g-C3N4 was prepared by thermal evaporation and condensation method in closed environment. The prepared g-C3N4powder was further used to fabricate thin films by novel process. The various characterization techniques were used to investigate the properties of thin film of g-C3N4. A photocatalytic dye degradation setup was used to study the photocatalytic activity of the g-C3N4 thin film and the effect of dye concentration on degradation efficiency and reusability of thin film was also studied. Keywords: Graphitic carbon nitride thin films, Photocatalytic dye degradation, Rhodamine B, Wastewater, Immobilized photocatalyst.
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