MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202611117320 A) filed by Vivekananda Institute Of Professional Studies - Technical Campus on September 30, 2026, for A System And Method For Automated Generation Of Production-Ready Two-Dimensional Garment Patterns.
Inventors include Dr. Aashita Chhabra; Shubh Gupta; and Vaanya Verma.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: The invention relates to computer-implemented garment pattern engineering and discloses a dependent pipeline that converts a 2D garment sketch in JPEG or PNG format, or a 3D garment model in OBJ or FBX format, into production-ready 2D garment patterns. For a 2D route, an input module supplies sketch data and optional body measurements to a pre-processing and feature extraction module performing OpenCV-based segmentation and trained convolutional neural network classification to identify garment components including front panel, back panel, sleeve, collar, and pocket, followed by an AI pattern generation core using GANs or diffusion models trained on garment-pattern datasets to generate initial pattern pieces, pattern blocks, or slopers. For a 3D route, a 3D-to-2D flattening module applies least-squares conformal mapping. Seam lines, seam allowances, notch marks, automated grading, smart nesting, and SVG or DXF export improve speed, consistency, size scalability, and manufacturing readiness.
Disclaimer: Curated by HT Syndication.
