MUMBAI, India, Oct. 26 -- Intellectual Property India has published a patent application (202641123180 A) filed by Prayaga Venkata Ramakrishna on October 14, 2026, for A System And Method For Performing Extreme Ultraviolet Lithography Using Ion-Beam Generation And Optical Scanning.
Inventor includes Prayaga Vaibhav Nischal.
The application for the patent was published on October 23, 2026, under issue no. 43/2026.
Abstract: A system and method for performing extreme ultraviolet lithography using ion-beam generation and optical scanning is disclosed. The system (100) includes a light source region within a chamber. A target assembly (104) includes a crucible (106) retaining tin and an induction coil (108) heating tin to a molten state. An ion-beam source (110) directs a heavy-metal alloy ion beam onto the molten tin to form an EUV-emitting plasma. A pulse driver (118) supplies excitation pulses to the ion-beam source. Ultrasonic piezoelectric actuators (124) generate acoustic vortices in low-pressure helium to remove vaporized tin from an optical path, while a cold-trap collector condenses vaporized tin and returns condensed tin to the target assembly. A reflective spatial light modulator spatially modulates the radiation, and piezoelectric quartz actuators sequentially steer modulated radiation across a stationary substrate. A control unit (144) synchronizes source excitation, spatial modulation, and scanning using layout data and positional feedback. FIG. 1
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