MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202611116808 A) filed by Noida Institute Of Engineering And Technology Niet on September 30, 2026, for Apparatus And Method For Precision Deposition Of Polymeric Hollow Droplets With Adaptive Shell- Thickness Control.
Inventors include Prachee Srivastava; and Anurag Jha.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: A polymeric hollow droplet precision deposition system (100) comprises a coaxial droplet generation assembly (110) with concentric outer and inner nozzles (112, 114), a shell-thickness regulation module (120) with flow rate controllers (122), a piezoelectric nozzle gap adjuster (128), and an in-line viscosity sensor (126), a monitoring and feedback module (150) with an in-flight droplet characterization sensor (158), an image processing unit (154), and a deposition quality analyzer (156) incorporating a convolutional neural network, and a central processing and control unit (160) executing a proportional-integral-derivative adaptive control algorithm. The system enables real-time closed-loop regulation of shell thickness and on-the-fly polymer concentration adjustment without halting deposition. A method selects among complete deposition, partial deposition, and controlled detachment regimes by coordinating Weber and Deborah numbers through a phase space map.
Disclaimer: Curated by HT Syndication.
