MUMBAI, India, June 30 -- Intellectual Property India has published a patent application (202647075381 A) filed by Rhodia Operations on June 18, 2026, for Aqueous Dispersion Comprising Particles Of Cerium Oxide With Adsorbed Polyoxometalates Species Thereon, Process For Producing The Same And Use Thereof In Polishing.
Inventors include Hernandez, Julien; Toth, Rka; Boudot, Mickal; Bertry, Laure; and Pellerin, Morgane.
The application for the patent was published on June 26, 2026, under issue no. 26/2026.
Abstract: The invention relates to an aqueous dispersion comprising particles of cerium oxide with polyoxometalates species adsorbed thereon, to a process for producing the same and to the use of the dispersion in polishing applications, advantageously in chemical mechanical polishing.
Disclaimer: Curated by HT Syndication.