MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202641094486 A) filed by Vellore Institute Of Technology, Chennai on August 04, 2026, for Attendance Management System.
Inventors include Aditya Kumar; Kumar Anurag; Vaibhav Rohella; and U. Vignesh.
The application for the patent was published on August 07, 2026, under issue no. 32/2026.
Abstract: Embodiments of the present disclosure relate to a system (100) and a method (600) of attendance management. The system (100) provides a cloud-native face recognition attendance management platform that combines facial recognition, adaptive identity matching, secure biometric storage, and real-time attendance analytics within a unified architecture. The system (100) receives image frames from one or more image acquisition devices, detects and aligns facial regions, generates facial embedding vectors, retrieves enrolled embeddings, and identifies individuals through adaptive similarity matching. Further, the system (100) validates recognized identities using multi-frame temporal consistency verification before recording attendance events with timestamps, confidence scores, and session metadata. The system (100) maintains encrypted attendance records, generates analytical insights and attendance reports, supports role-based access control, synchronizes attendance information with LMS and ERP platforms, provides real-time dashboard visualization, and enables scalable deployment across cloud and edge computing environments.
Disclaimer: Curated by HT Syndication.
