MUMBAI, India, July 31 -- Intellectual Property India has published a patent application (202647088593 A) filed by Cymer, LLC on July 21, 2026, for Chamber Erosion Byproduct Filter.
Inventors include Ubnoske, Stephen, Michael; Satija, Aman; and Xiang, Xun.
The application for the patent was published on July 24, 2026, under issue no. 30/2026.
Abstract: A lithographic apparatus includes a chamber that produces radiation. The chamber includes an internal wall having a surface facing into the chamber and a filter attached to the surface of the internal wall of the chamber. The filter includes a plurality of screens stacked on top of one another along a stacking direction that is perpendicular to the surface of the internal wall of the chamber on which the filter is disposed. The plurality of screens include a central region and an edge region surrounding the central region. A first separation between the central region and the surface of the internal wall of the chamber along the stacking direction is greater than a second separation between the edge region and the surface of the internal wall of the chamber along the stacking direction.
Disclaimer: Curated by HT Syndication.
