MUMBAI, India, July 24 -- Intellectual Property India has published a patent application (202647086565 A) filed by Asml Netherlands B. V. on July 15, 2026, for Charged Particle-Optical Apparatus And Method Of Processing A Sample.
Inventors include Wieland, Marco, Jan-Jaco; Maassen, Martinus, Gerardus, Johannes, Maria; Slot, Erwin Number; and Tsiatmas, Anagnostis.
The application for the patent was published on July 17, 2026, under issue no. 29/2026.
Abstract: A charged particle-optical apparatus comprises: a charged particle-optical device configured to direct a beam grid of beams of charged particles toward a region of a sample surface of a sample; a sample support configured to support the sample; and a controller configured to control the charged particle-optical apparatus to selectively apply one of a plurality of predetermined beam area patterns so as to process portions of respective beam areas of the region with respective beams in accordance with the applied beam area pattern; wherein the beam area patterns are associated with respective proportions of the beam areas being processed, and at least one of the beam area patterns comprises at least one elongate strip.
Disclaimer: Curated by HT Syndication.
