MUMBAI, India, July 24 -- Intellectual Property India has published a patent application (202647086072 A) filed by Asml Netherlands B. V. on July 14, 2026, for Charging Particle-Optical Device, Charged Particle-Optical Module, Method Of Projecting A Plurality Of Charged Particle Beams Towards A Sample.
Inventor includes Wieland, Marco, Jan-Jaco.
The application for the patent was published on July 17, 2026, under issue no. 29/2026.
Abstract: The disclosure relates to apparatus and methods for projecting a plurality of charged particle beams towards a sample, and particularly for projecting the beams with reduced aberrations. In one arrangement, a charged particle-optical device comprises a lens array configured to focus a plurality of beams in a beam grid towards a sample position. A corrector comprises at least two aperture arrays having aperture patterns, including one or more pairs of facing aperture surfaces. Each pair corresponds to a species of correction for a respective aberration of the beam grid. A voltage supply is configured to apply a potential difference between the or each pair of facing aperture surfaces to cause the respective species of correction to be applied, the applied potential difference selectable to define a magnitude of the respective species of correction substantially independently of focusing of the beam grid at a sample position.
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