MUMBAI, India, Aug. 10 -- Intellectual Property India has published a patent application (202647091082 A) filed by Asml Netherlands B. V. on July 27, 2026, for Clamping With A Removable Membrane In A Lithography Apparatus.
Inventors include Monkman, Eric, Justin; Burroughs, John, Robert; Chieda, Michael, Andrew; Perez-Falcon, Victor, Antonio; Finney, Nathan, Robert; Uitterdijk, Tammo; Kochersperger, Peter, Conrad; Van De Kerkhof, Marcus, Adrianus; Stevens, Lucas, Henricus, Johannes; Van Eden, Gustaaf, Galein; Berghout, Pieter; and Van De Ven, Emiel, Anton.
The application for the patent was published on July 31, 2026, under issue no. 31/2026.
Abstract: A clamping system is described. The clamping system includes a membrane that functions as an intermediate layer between a reticle (or a wafer) and a clamp in a lithography apparatus. This membrane can be replaced in the field if it experiences wear, for example, instead of having to replace permanent components of the clamp, which is far more difficult. Because the membrane’s dimensions are similar to those of a typical reticle, the membrane can be replaced using an existing reticle handling system that is a part of the lithography apparatus. The membrane is relatively thin and compliant compared to the clamp and/or the reticle such that the membrane may be configured to first couple to the reticle and conform to a shape of the reticle, and then couple to the clamp. This way the membrane forms a known tunable interface configured for coupling the reticle to the clamp.
Disclaimer: Curated by HT Syndication.
