MUMBAI, India, July 24 -- Intellectual Property India has published a patent application (202611058454 A) filed by Indian Institute Of Technology Mandi on May 07, 2026, for Copper-Incorporated Amine-Functionalized Mesoporous Adsorbent For Anionic Dye Removal From Aqueous Waste, And Method Thereof.
Inventors include Dipankar Deb; Mahuya Bandyopadhyay; Sourav Das; Gunjan Som; Mohammed Ajaz Memon; and Rutvi Pandya.
The application for the patent was published on July 17, 2026, under issue no. 29/2026.
Abstract: Disclosed herein is a cost-effective reusable copper-incorporated amine-functionalized mesoporous heterogeneous adsorbent applicable for anionic dye removal from aqueous waste, and method of its production. The method comprises steps of forming (S1) a mesoporous silica (100) from a mixture formed of tetraethyl orthosilicate (TEOS), triblock copolymer (Pluronic P123), hydrochloric acid (HCl), water (H2O), and butanol (n-BuOH) at molar ratio of 1:0.017:1.93:195:1.31; refluxing (S2) the mesoporous silica material (100) mixed with (3-Aminopropyl)triethoxysilane (APTES) at a weight ratio of 1:2 in toluene at 110 °C for 12 hours, followed by filtering, washing and drying solid resultant to obtain an amine-functionalized mesoporous silica (200); synthesizing (S3) a copper complex (300) from a mixture of 2,9-dimethyl-1,10-phenanthroline and copper (II) nitrate salt at a weight ratio of 1:2; mixing (S4) the amine-functionalized mesoporous silica (200) with the copper complex (300) at a weight ratio of 5:1 in dry toluene; and heating (S5) the mixture in reflux condition at 110 °C for 18 hours followed by filtering, washing, and drying solid resultant to obtain the adsorbent (400). Fig. 1
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