MUMBAI, India, Oct. 26 -- Intellectual Property India has published a patent application (202617091666 A) filed by Basf Se on July 28, 2026, for Cosmetic Composition Comprising Bis-Ethylhexyloxyphenol Methoxyphenyl Triazine.
Inventors include Sohn, Myriam; and Krus, Stanislaw.
The application for the patent was published on October 23, 2026, under issue no. 43/2026.
Abstract: Cosmetic composition comprising (i) bemotrizinol (bis-ethylhexyloxyphenol methoxyphenyl triazine), (ii) a water-soluble organic UV filter or a salt thereof, (iii) at least one inorganic UV filter, wherein the cosmetic composition is free of the UV filters from the group consisting of hexyl 2-[4-(diethylamino)-2-hydroxybenzoyl] benzoate (INCI diethylamino hydroxybenzoyl hexyl benzoate), 2,2' - M ethy I en bis [6- (2 H - benzotriazo I -2 -y I) -4- (1, 1,3,3 -tetra methyl butyl) phenol] (bisoctrizole), 3,3,5-Trimethy Icyclohexyl 2-hydroxybenzoate (I NCI Homosalate), polysilicone-15, and 2-hydroxy-4-methoxybenzophenone (I NCI benzophenone-3) and a method for increasing the water resistance of a cosmetic composition comprising bis-ethylhexyloxyphenol methoxyphenyl triazine (bemotrizinol), zinc oxide, and titanium dioxide comprising the step of adding a water-soluble organic UV filter or a salt thereof to the cosmetic composition.
Disclaimer: Curated by HT Syndication.
