MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202621057479 A) filed by Punam Sawale; Kunal Amul Unhale; Aditya Santosh Ulemale; Vaidik Rameshwar Nipane; and Yashkumar Mahendra Valvi on May 06, 2026, for Decentralized Social Platform Using Ipfs, Ml Xai Moderation And Xchacha20 Poly1305 Encryption.
Inventors include Punam Sawale; Kunal Amul Unhale; Aditya Santosh Ulemale; Vaidik Rameshwar Nipane; and Yashkumar Mahendra Valvi.
The application for the patent was published on August 07, 2026, under issue no. 32/2026.
Abstract: The subject matter of this application includes an AI-driven social media system that operates as a decentralized system using blockchain and IPFS so that all data are stored in a decentralized and tamper-proof manner. It incorporates machine learning algorithms (CNN and BiLSTM) for the real time identification of hate speech and abuse; it also has an explainable artificial intelligence component to provide users with transparent explanations of how moderation decisions were made. XChaCha20- Polyl305 will be used to encrypt content prior to flagging and store on the blockchain to address the issue of immutable blockchain content. In addition, the system will replace community based voting with machine learning based moderation to eliminate bot driven manipulation of votes.
Disclaimer: Curated by HT Syndication.
