MUMBAI, India, July 30 -- Intellectual Property India has published a patent application (202641088183 A) filed by Sathyabama Institute Of Science And Technology; P. Karthika; and G. Sukanya on July 20, 2026, for Deep Learning Based Invisible Hazardous Gas Dispersion Mapping And Leak Origin Detection System.
Inventors include P. Karthika; and G. Sukanya.
The application for the patent was published on July 24, 2026, under issue no. 30/2026.
Abstract: ABSTRACT DEEP LEARNING BASED INVISIBLE HAZARDOUS GAS DISPERSION MAPPING AND LEAK ORIGIN DETECTION SYSTEM The main design of the present invention discloses a Deep Learning-Based Invisible Hazardous Gas Dispersion Mapping and Leak Origin Detection System, which comprises a sensor acquisition unit including gas sensors, thermal cameras, infrared gas cameras, ultrasonic sensors, airflow sensors and environmental sensors, a data acquisition and preprocessing unit, an artificial intelligence analysis unit, a controller unit and a monitoring interface. The main purpose of the present invention is to detect invisible hazardous gas leakage, analyze gas dispersion behavior, identify leak origin locations and predict hazardous spread patterns in industrial environments. The acquired data undergoes signal synchronization, noise removal, image enhancement and data normalization before analysis. The AI analysis unit utilizes CNN, LSTM, transformer and anomaly detection models to generate gas dispersion maps, leak-source estimations and hazard-zone predictions. Based on the generated assessments, the controller activates alarms, ventilation systems and gas isolation mechanisms to support industrial safety management and emergency response.
Disclaimer: Curated by HT Syndication.
