MUMBAI, India, July 30 -- Intellectual Property India has published a patent application (202621067486 A) filed by Swati Bhavesh Sheth; and Bhavesh Sheth on May 29, 2026, for Detachable Collar Cover With Interference-Fit Based Self-Retaining Mechanism.
Inventors include Swati Bhavesh Sheth; and Bhavesh Sheth.
The application for the patent was published on July 24, 2026, under issue no. 30/2026.
Abstract: ABSTRACT DETACHABLE COLLAR COVER WITH INTERFERENCE-FIT BASED SELF-RETAINING MECHANISM The present invention relates to a detachable collar cover (100) for a shirt collar. The collar cover (100) comprises a pre-formed three-dimensional collar shell (102) defining an internal cavity configured to receive a shirt collar including a collar band portion and a fold-over collar portion, wherein the collar shell (102) comprises inwardly biased edge regions configured to elastically deform during placement and to generate a self-retaining interference-fit engagement upon recovery. The collar cover (100) further comprises a plurality of discrete retention regions (104) positioned at spaced locations on the collar shell (102) to stabilize positioning without continuous peripheral fastening. The collar shell (102) is configured to simultaneously cover an inner neck-contacting surface and an outer exposed surface of the shirt collar, and is formed as a shape-retaining, washable, and reusable multilayer structure, thereby enabling stable positioning during use without permanent attachment or visibly exposed fastening elements. FIG. 1 will be the reference figure.
Disclaimer: Curated by HT Syndication.
