MUMBAI, India, June 30 -- Intellectual Property India has published a patent application (202647074370 A) filed by Asml Netherlands B. V. on June 16, 2026, for Device And Method For Projecting A Plurality Of Charged Particle Beams.
Inventors include Krecinic, Faruk; Wieland, Marco, Jan-Jaco; Mangnus, Albertus, Victor, Gerardus; Koning, Johan, Joost; Lw, Peter; De Langen, Johannes, Cornelis, Jacobus; Scheffers, Paul, Ijmert; and Toonen, Wiebe, Floris.
The application for the patent was published on June 26, 2026, under issue no. 26/2026.
Abstract: The present disclosure provides a charged particle element and relates apparatus and methods. In one arrangement, the element comprises a beam manipulator configured to operate on a plurality of charged particle beams in a beam grid. The beam manipulator comprises a plurality of plates. Each plate has two surfaces and a plurality of apertures. The plates comprises at least one curved-surface plate with a curved surface. The curved surface faces a facing surface of an adjacent plate. Deflections are applied to beams by controlling a potential difference between the curved surface and the facing surface.
Disclaimer: Curated by HT Syndication.
