MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202617053894 A) filed by Yield Engineering Systems, Inc. on April 28, 2026, for Double-Sided Scrubber For Substrate Cleaning.
Inventors include Bajaj, Rajeev; and Stone, Al.
The application for the patent was published on August 07, 2026, under issue no. 32/2026.
Abstract: A substrate cleaning device includes a double-sided scrubber that directs a liquid to a substrate as it moves back-and-forth between a pair of rotating brushes. The device may also include a first set of nozzles and a second set of nozzles. The first set of nozzles may be configured to spray a first liquid at an interface between the substrate and rotating brushes and the second set of nozzles may be configured to spray a second liquid at the interface as the substrate moves back-and-forth between the pair of rotating brushes.
Disclaimer: Curated by HT Syndication.
