MUMBAI, India, July 7 -- Intellectual Property India has published a patent application (202647076946 A) filed by Organo Corporation on June 22, 2026, for Exhaust Gas Treatment System, Exhaust Gas Treatment Method, And Method For Modifying Exhaust Gas Treatment System.
Inventors include Narita Hiroki; and Chen Jinxian.
The application for the patent was published on July 03, 2026, under issue no. 27/2026.
Abstract: An exhaust gas treatment system 10 comprises: an exhaust gas separation device 11 that receives a first gas 22a containing a specific substance, separates a part of the specific substance contained in the first gas 22a, and discharges a second gas 22b in which the content of the specific substance is smaller than that of the first gas 22a; a detoxifying device 12 that treats the second gas 22b to solubilize the specific substance, dissolves the solubilized specific substance into supplied water, and discharges a first discharge water 23a; and a discharge water treatment facility 13 that receives the first discharge water 23a, removes the specific substance from the first discharge water 23a, and recovers the discharge water from which the specific substance has been removed as supplemental water for the supplied water.
Disclaimer: Curated by HT Syndication.
